{"id":5834,"date":"2023-01-06T13:31:19","date_gmt":"2023-01-06T13:31:19","guid":{"rendered":"https:\/\/longchangchemical.com\/?p=5834"},"modified":"2026-04-28T10:42:13","modified_gmt":"2026-04-28T10:42:13","slug":"alicyclic-epoxy-resin-in-uv-light-curing-coating","status":"publish","type":"post","link":"https:\/\/longchangchemical.com\/tr\/alicyclic-epoxy-resin-in-uv-light-curing-coating\/","title":{"rendered":"UV \u0131\u015f\u0131kla k\u00fcrlenen kaplamada alisiklik epoksi re\u00e7ine nas\u0131l uygulan\u0131r?"},"content":{"rendered":"

UV \u0131\u015f\u0131kla k\u00fcrlenen kaplamada alisiklik epoksi re\u00e7ine nas\u0131l uygulan\u0131r?<\/strong><\/h1>\n

<\/p>\n

Quick answer:<\/strong> In most UV systems, photoinitiators are selected by balancing wavelength fit, through-cure, color control, and line speed. Buyers usually compare a blended package instead of one isolated product.<\/p>\n

<\/p>\n

UV k\u00fcrleme teknolojisi genel olarak UV serbest radikal ve UV katyonik sistemlere ayr\u0131l\u0131r, metal kutularda m\u00fckemmel i\u015fleme \u00f6zelliklerine sahip UV katyonik kaplamalar, haddelenmi\u015f \u00e7elik ve esnek ambalaj end\u00fcstrisi yayg\u0131n olarak kullan\u0131lmaktad\u0131r, ana pazar art\u0131k Avrupa ve Amerika Birle\u015fik Devletleri'ndedir.<\/p>\n

 <\/p>\n

 <\/p>\n

UV katyonik ve UV serbest radikal malzemeler \u00e7ok farkl\u0131d\u0131r, ancak genel bile\u015fim benzerdir. Katyonik sistemlere epoksi malzemeler hakimdir, ancak s\u0131radan bisfenol A tipi epoksi yava\u015f reaksiyona girer, alisiklik epoksi \/ oksetan tipi malzemelerin daha fazla uygulamas\u0131 vard\u0131r; serbest radikal sistemler art\u0131k ticari olarak \u00e7ok olgunla\u015fm\u0131\u015ft\u0131r, epoksi \/ polyester \/ poli\u00fcretan modifiye akrilat malzemeler daha fazla \u00e7\u00f6z\u00fcm se\u00e7ene\u011fi sunar.<\/p>\n

 <\/p>\n

UV katyonik sistem, serbest radikal sisteme k\u0131yasla daha az \u00e7e\u015fit hammadde se\u00e7ebilir ve polimer esas olarak d\u00fc\u015f\u00fck viskoziteli alisiklik epoksi re\u00e7inedir. \u00d6rnek olarak alisiklik epoksi re\u00e7ineleri ele alal\u0131m.<\/p>\n

\u00c7e\u015fitli safl\u0131k \u00f6zelliklerine sahip TTA21, UV kaplama end\u00fcstrisindeki en bask\u0131n \u00fcr\u00fcnd\u00fcr. Katyonik UV kaplamalar\u0131n uygulanmas\u0131 \u00f6nemli \u00f6l\u00e7\u00fcde artmaya devam ettik\u00e7e, TTA21 taraf\u0131ndan temsil edilen alisiklik epoksi re\u00e7inelerinin miktar\u0131n\u0131n artmas\u0131 beklenmektedir.<\/p>\n

 <\/p>\n

M\u00fcrekkep\/kaplamalar\u0131n spesifik \u00fcr\u00fcn uygulamas\u0131nda, her ikisinin de k\u00fcrleme enerjisi sa\u011flamak i\u00e7in UV \u0131\u015f\u0131\u011f\u0131na ihtiya\u00e7 duymas\u0131n\u0131n yan\u0131 s\u0131ra, iki sistem performans ve reaksiyon \u00f6zellikleri a\u00e7\u0131s\u0131ndan b\u00fcy\u00fck farkl\u0131l\u0131klar g\u00f6stermektedir.<\/p>\n

 <\/p>\n

1. Oksijen engelleyici etki<\/p>\n

UV katyonik sistemin oksijen engelleme etkisi yoktur, ancak sudan daha \u00e7ok korkar, nem katyonik sistemin k\u00fcrleme verimlili\u011fini etkileyecektir; UV serbest radikalleri bunun tam tersidir ve oksijen engellemeden daha \u00e7ok etkilenir.<\/p>\n

 <\/p>\n

2. Substrat yap\u0131\u015fmas\u0131<\/p>\n

Genellikle cam \/ metal \/ y\u00fcksek yo\u011funluklu plastik gibi alt tabakan\u0131n y\u00fczeyine yap\u0131\u015fmas\u0131 daha zor olan durumlarda, UV katyonu UV i\u00e7ermeyen bazdan daha iyi yap\u0131\u015fma performans\u0131na sahiptir.<\/p>\n

 <\/p>\n

3. Hacim b\u00fcz\u00fclme oran\u0131<\/p>\n

UV serbest radikal sistem form\u00fclasyonu k\u00fcrleme b\u00fcz\u00fclme oran\u0131 genellikle 10%'nin \u00fczerindeyken, UV katyon sistemi 1-3% b\u00fcz\u00fclme oran\u0131n\u0131 kontrol edebilir, hacim b\u00fcz\u00fclmesini \u00e7\u00f6zmek i\u00e7in iyi bir \u00e7\u00f6z\u00fcmd\u00fcr.<\/p>\n

 <\/p>\n

4. Koyu k\u00fcrlenme \u00f6zellikleri<\/p>\n

UV katyon sistemi, k\u00fcrlemeden sonra malzemeyi tamamlamak i\u00e7in \u0131\u015f\u0131k kayna\u011f\u0131 \u0131\u015f\u0131nlamas\u0131n\u0131 durdurduktan sonra i\u00e7 katmana tepki vermeye devam edebilir, bu koyu k\u00fcrleme \u00f6zellikleridir, kal\u0131n kaplama uygulamalar\u0131 i\u00e7in \u00e7ok uygundur, k\u00fcrleme h\u0131z\u0131ndan sonra katyonun \u0131s\u0131t\u0131lmas\u0131 \u00f6nemli \u00f6l\u00e7\u00fcde yard\u0131mc\u0131 olur; UV serbest radikal bir dur-kalk reaksiyon sistemidir.<\/p>\n

 <\/p>\n

5. \u0130leti\u015fim g\u00fcvenli\u011fi<\/p>\n

UV katyon sistemi reaksiyon derecesi 100%'ye yak\u0131nd\u0131r, g\u00fcvenlik REACH \/ FDA test sertifikas\u0131 olabilir, g\u0131da ambalaj\u0131 ve di\u011fer ilgili alanlarda kullan\u0131labilir.<\/p>\n

 <\/p>\n

6. I\u015f\u0131kla k\u00fcrlenme h\u0131z\u0131<\/p>\n

Genel olarak UV serbest radikal sistemi k\u00fcrleme h\u0131z\u0131 katyonik sisteme g\u00f6re, oksijen engelleyici \u00fcr\u00fcnlerden etkilenen katyonik y\u00fczey kurumas\u0131 daha h\u0131zl\u0131 olacakt\u0131r, ancak ger\u00e7ek kuruma h\u0131z\u0131 serbest radikal kadar h\u0131zl\u0131 de\u011fildir, reaksiyonu \u0131s\u0131tarak te\u015fvik edebilir ve sonunda \u00e7ok iyi bir tamamlanma derecesine ula\u015fabilirsiniz.<\/p>\n

 <\/p>\n

Form\u00fclasyon notlar\u0131<\/p>\n

 <\/p>\n

UV katyon sistemi, UV hibrid sistemi olarak adland\u0131r\u0131lan herhangi bir oranda UV serbest radikal sistemi ile kar\u0131\u015ft\u0131r\u0131labilir, oksijen bariyeri ve di\u011fer eksikliklerden etkilenen UV katyon ve UV serbest radikal b\u00fcz\u00fclmesinin g\u00f6receli k\u00fcrleme h\u0131z\u0131n\u0131 art\u0131rabilir, sistemin ayn\u0131 film kal\u0131nl\u0131\u011f\u0131 k\u00fcrleme enerjisi fark\u0131 b\u00fcy\u00fck de\u011fildir.<\/p>\n

 <\/p>\n

UV katyon sistemi, halka a\u00e7ma reaksiyonunun aktif noktas\u0131n\u0131 yapmak i\u00e7in Lewis g\u00fc\u00e7l\u00fc asit taraf\u0131ndan \u00fcretilen ba\u015flat\u0131c\u0131ya g\u00fcvenmektir, form\u00fcl genellikle malzemenin ba\u015flat\u0131c\u0131 aktivitesini etkileyecektir, esas olarak azo organik pigmentler (koruma yapmak i\u00e7in de\u011fi\u015ftirilebilir) ve TPO\/819\/907 ile kar\u0131\u015ft\u0131r\u0131lm\u0131\u015f serbest radikaller ve ba\u015flat\u0131c\u0131n\u0131n P, S ve di\u011fer elementlerini i\u00e7eren di\u011fer yap\u0131lar ve 115 \u00e7ok seviyeli amine benzer.<\/p>\n

 <\/p>\n

Nem, UV katyon sisteminin k\u00fcrlenmesi \u00fczerinde daha b\u00fcy\u00fck bir etkiye sahiptir, 50% i\u00e7indeki ortam nemini kontrol etmek uygundur; \u0131s\u0131tma ise reaksiyon h\u0131z\u0131n\u0131 art\u0131racakt\u0131r.<\/p>\n

 <\/p>\n

UV Fotoba\u015flat\u0131c\u0131<\/span><\/a> Ayn\u0131 seri \u00fcr\u00fcnler<\/strong><\/h2>\n

 <\/p>\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n
Fotoba\u015flat\u0131c\u0131 TPO<\/span><\/a><\/td>\nCAS 75980-60-8<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 TMO<\/span><\/a><\/td>\nCAS 270586-78-2<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 PD-01<\/span><\/a><\/td>\nCAS 579-07-7<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 PBZ<\/span><\/a><\/td>\nCAS 2128-93-0<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 OXE-02<\/span><\/a><\/td>\nCAS 478556-66-0<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 OMBB<\/span><\/a><\/td>\nCAS 606-28-0<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 MPBZ (6012)<\/span><\/a><\/td>\nCAS 86428-83-3<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 MBP<\/span><\/a><\/td>\nCAS 134-84-9<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 MBF<\/span><\/a><\/td>\nCAS 15206-55-0<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 LAP<\/span><\/a><\/td>\nCAS 85073-19-4<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 ITX<\/span><\/a><\/td>\nCAS 5495-84-1<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 EMK<\/span><\/a><\/td>\nCAS 90-93-7<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 EHA<\/span><\/a><\/td>\nCAS 21245-02-3<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 EDB<\/span><\/a><\/td>\nCAS 10287-53-3<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 DETX<\/span><\/a><\/td>\nCAS 82799-44-8<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 CQ \/ Camphorquinone<\/span><\/a><\/td>\nCAS 10373-78-1<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 CBP<\/span><\/a><\/td>\nCAS 134-85-0<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 BP \/ Benzofenon<\/span><\/a><\/td>\nCAS 119-61-9<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 BMS<\/span><\/a><\/td>\nCAS 83846-85-9<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 938<\/span><\/a><\/td>\nCAS 61358-25-6<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 937<\/span><\/a><\/td>\nCAS 71786-70-4<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 819 DW<\/span><\/a><\/td>\nCAS 162881-26-7<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 819<\/span><\/a><\/td>\nCAS 162881-26-7<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 784<\/span><\/a><\/td>\nCAS 125051-32-3<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 754<\/span><\/a><\/td>\nCAS 211510-16-6 442536-99-4<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 6993<\/span><\/a><\/td>\nCAS 71449-78-0<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 6976<\/span><\/a><\/td>\nCAS 71449-78-0 89452-37-9 108-32-7<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 379<\/span><\/a><\/td>\nCAS 119344-86-4<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 369<\/span><\/a><\/td>\nCAS 119313-12-1<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 160<\/a><\/span><\/td>\nCAS 71868-15-0<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 1206<\/span><\/a><\/td>\n<\/td>\n<\/tr>\n
Fotoba\u015flat\u0131c\u0131 1173<\/span><\/a><\/td>\nCAS 7473-98-5<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

 <\/p>\n

<\/p>\n

A practical selection route for photoinitiator-related projects<\/h2>\n

When technical buyers or formulators screen photoinitiators, the most useful decision frame is usually cure quality plus application fit: which package cures reliably, keeps appearance acceptable, and still works under the lamp, film thickness, and substrate conditions of the actual process.<\/p>\n