{"id":10143,"date":"2026-06-17T00:00:48","date_gmt":"2026-06-17T00:00:48","guid":{"rendered":"https:\/\/longchangchemical.com\/?p=10143"},"modified":"2026-06-17T12:05:15","modified_gmt":"2026-06-17T12:05:15","slug":"dry-film-photoresist-photoinitiator","status":"publish","type":"post","link":"https:\/\/longchangchemical.com\/ko\/dry-film-photoresist-photoinitiator\/","title":{"rendered":"Photoinitiator for Dry Film Photoresist: How to Choose 1206, 369, and 784"},"content":{"rendered":"<p><strong>\ube60\ub978 \ub2f5\ubcc0:<\/strong> Buyers choosing a <strong>photoinitiator for dry film photoresist<\/strong> \ubcf4\ud1b5 \ubd84\ub9ac\ud560 \ub54c \ub354 \ub098\uc740 \ud6c4\ubcf4 \ubaa9\ub85d\uc744 \uc5bb\uc2b5\ub2c8\ub2e4. <strong>thin-film 365 nm sensitivity<\/strong>, <strong>long-wave cure-through in more difficult imaging films<\/strong>, \uadf8\ub9ac\uace0 <strong>visible-light or laser-oriented precision imaging<\/strong> before requesting samples. In Longchang&#8217;s current product positioning, <a href=\"https:\/\/longchangchemical.com\/ko\/product\/photoinitiator-1206\/\">\uad11\uac1c\uc2dc\uc81c 1206<\/a> deserves the first look when the dry-film job is close to <strong>very thin imaging layers<\/strong>, <strong>365 nm processing<\/strong>, <strong>black-pigment-sensitive films<\/strong>, \uadf8\ub9ac\uace0 <strong>photosensitive or electronic-material ink logic<\/strong>. <a href=\"https:\/\/longchangchemical.com\/ko\/product\/photoinitiator-369-cas-119313-12-1\/\">\uad11\uac1c\uc2dc\uc81c 369<\/a> moves up when the team is more worried about <strong>long-wave response<\/strong>, <strong>darker or more optically difficult dry-film systems<\/strong>, \uadf8\ub9ac\uace0 <strong>photoresist-adjacent imaging that needs stronger penetration<\/strong>. <a href=\"https:\/\/longchangchemical.com\/ko\/product\/photoinitiator-784-cas-125051-32-3\/\">\uad11\uac1c\uc2dc\uc81c 784<\/a> becomes the stronger route when the process is really about <strong>visible-light activation<\/strong>, <strong>laser exposure<\/strong>, or <strong>higher-precision photosensitive-layer imaging<\/strong>.<\/p>\n<p>That is the commercially useful split. Dry film photoresist is not just another generic UV-coating problem, and it is not identical to every PCB photoresist or display-material decision either.<\/p>\n<h2>Why dry film photoresist deserves its own selection page<\/h2>\n<p>Longchang already has live guides for <a href=\"https:\/\/longchangchemical.com\/ko\/pcb-photoresist-photoinitiator\/\">PCB photoresists<\/a>, <a href=\"https:\/\/longchangchemical.com\/ko\/laser-direct-imaging-photoinitiator\/\">laser direct imaging<\/a>, <a href=\"https:\/\/longchangchemical.com\/ko\/photosensitive-ink-photoinitiator\/\">photosensitive inks<\/a>, \uadf8\ub9ac\uace0 <a href=\"https:\/\/longchangchemical.com\/ko\/electronic-material-ink-photoinitiator\/\">electronic material inks<\/a>. But buyers often start with a narrower sourcing question: <strong>which photoinitiator route should we screen for a dry film photoresist program?<\/strong><\/p>\n<p>That intent is different from a broad PCB-cationic page and different from a display-only page. Dry-film buyers usually care about laminated-film behavior, image transfer, exposure-route fit, and whether the film cures cleanly without turning the first sample round into a slow trial-and-error cycle.<\/p>\n<h2>What dry-film buyers usually screen first<\/h2>\n<p>General industry discussion of dry-film photoresist commonly centers on <strong>\ud544\ub984 \ub450\uaed8<\/strong>, <strong>exposure source<\/strong>, <strong>resolution or pattern fidelity<\/strong>, \uadf8\ub9ac\uace0 <strong>process fit across lamination, exposure, and development<\/strong>. That framing is useful here too, even before a final formulation is locked.<\/p>\n<ul>\n<li><strong>Is the line still centered on 365 nm thin-film imaging?<\/strong> Thin dry films often reward a different first screen than deeper or more difficult systems.<\/li>\n<li><strong>Is the optical path easy or difficult?<\/strong> Some dry-film structures behave more like a clean thin image layer, while others act closer to darker or more penetration-limited systems.<\/li>\n<li><strong>Is the job conventional UV-first, long-wave UV, visible-light, or laser-assisted?<\/strong> The shortlist should change as soon as the real exposure route is known.<\/li>\n<li><strong>Is the dry film closer to routine circuit imaging, precision electronic patterning, or advanced photosensitive-layer work?<\/strong> Similar process names can still hide different qualification bottlenecks.<\/li>\n<li><strong>Does the team need only a practical benchmark, or a route that fits a more advanced imaging platform?<\/strong> That choice often decides whether 1206, 369, or 784 should be tested first.<\/li>\n<\/ul>\n<p>Those questions usually narrow the first sample plan faster than debating many similar grades at once.<\/p>\n<h2>Quick comparison table: 1206 vs 369 vs 784 for dry film photoresist<\/h2>\n<table>\n<thead>\n<tr>\n<th>\uad6c\ub9e4 \uc694\uc778<\/th>\n<th>1206<\/th>\n<th>369<\/th>\n<th>784<\/th>\n<\/tr>\n<\/thead>\n<tbody>\n<tr>\n<td>Direct company-supported relevance<\/td>\n<td>Photosensitive inks, electronic material inks, TFT-LCD color filters, thin-film 365 nm and black-pigment-sensitive systems<\/td>\n<td>Photoresist, solder mask inks, photopolymers for imaging applications, strong 350 to 380 nm response<\/td>\n<td>Photosensitive layers, laser direct imaging, UV and visible-light curing, precision electronic-material relevance<\/td>\n<\/tr>\n<tr>\n<td>Best first-screen wavelength logic<\/td>\n<td>High sensitivity at 365 nm<\/td>\n<td>Long-wave UV capture at 350 to 380 nm<\/td>\n<td>UV plus visible-light or suitable laser irradiation<\/td>\n<\/tr>\n<tr>\n<td>Film-build logic<\/td>\n<td>Explicit fit for ultra-thin 1 to 30 \u03bcm systems<\/td>\n<td>Stronger case when penetration or deeper cure is harder<\/td>\n<td>Useful when the process is a precision-imaging route rather than only a thin-film benchmark<\/td>\n<\/tr>\n<tr>\n<td>\ucd5c\uc801 \uccab \ubc88\uc9f8 \uc801\ud569<\/td>\n<td>Thin dry-film photoresist layers and black-sensitive 365 nm imaging<\/td>\n<td>Darker, more difficult, or longer-wave dry-film imaging systems<\/td>\n<td>Visible-light, laser, and advanced precision imaging routes<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<h2>1206\uc774 \ub354 \uc801\ud569\ud560 \ub54c<\/h2>\n<p>1206 deserves the first sample slot when the dry-film project behaves like a <strong>very thin 365 nm imaging problem<\/strong> and the team wants a route already supported by Longchang for <strong>photosensitive inks<\/strong>, <strong>electronic material inks<\/strong>, \uadf8\ub9ac\uace0 <strong>thin high-sensitivity systems<\/strong>. The current product page directly states that 1206 is suitable for <strong>TFT-LCD flat-panel display color filters<\/strong>, <strong>photosensitive inks<\/strong>, \uadf8\ub9ac\uace0 <strong>electronic material inks<\/strong>. The same page also supports <strong>high sensitivity to 365 nm wavelength<\/strong>, suitability for <strong>colored systems including black pigment systems<\/strong>, tolerance up to <strong>35 wt% carbon black pigment<\/strong>, and relevance to <strong>ultra-thin film 1 to 30 \u03bcm curing systems<\/strong>.<\/p>\n<p>That usually makes 1206 the cleanest first screen when:<\/p>\n<ul>\n<li>the dry-film structure is thin and highly exposure-sensitive<\/li>\n<li>the line is built around a 365 nm process window<\/li>\n<li>the imaging layer has black pigment or a more light-blocking color load than a simple clear film<\/li>\n<li>the buyer wants a benchmark closer to photosensitive or electronic-material imaging than to a broad bulk coating<\/li>\n<\/ul>\n<p>If the project is mainly about thin laminated imaging layers and 365 nm efficiency, 1206 is often the most defensible place to start.<\/p>\n<h2>When 369 should move ahead<\/h2>\n<p>369 becomes the better first screen when the dry-film photoresist stops behaving like a simple thin-film benchmark and starts behaving like a <strong>more difficult, darker, or penetration-limited imaging system<\/strong>. Longchang&#8217;s current 369 page directly places the product in the <strong>electronics industry<\/strong> for <strong>solder mask inks<\/strong> \ubc0f <strong>photoresist<\/strong>, and it repeatedly emphasizes the product&#8217;s ability to capture <strong>long-wave ultraviolet light at 350 to 380 nm<\/strong>. The same page also frames 369 as especially useful in <strong>dark-color systems<\/strong>, <strong>pigmented coatings<\/strong>, \uadf8\ub9ac\uace0 <strong>photopolymers for imaging applications<\/strong>.<\/p>\n<p>That usually pushes 369 forward when:<\/p>\n<ul>\n<li>the real issue is cure-through, not only top-surface image formation<\/li>\n<li>the dry film is more optically difficult than a routine thin clear benchmark<\/li>\n<li>the buyer wants a stronger long-wave route before broadening the shortlist<\/li>\n<li>the project sits close to photoresist, solder-mask-adjacent, or deeper imaging-photopolymer logic<\/li>\n<\/ul>\n<p>In short, 369 is the safer first move when the main risk is not basic thin-film sensitivity but <strong>light penetration into a more demanding dry-film imaging structure<\/strong>.<\/p>\n<h2>When 784 becomes the stronger route<\/h2>\n<p>784 belongs in a different lane because it is more clearly tied to <strong>precision imaging and visible-light-capable materials<\/strong>. Longchang positions 784 for <strong>photosensitive layers<\/strong>, <strong>holographic photography<\/strong>, <strong>laser direct imaging<\/strong>, <strong>three-dimensional lithography<\/strong>, and broader <strong>electronics, photoresists, and precision electronic materials<\/strong>. The current page also states that curing can be carried out under <strong>ultraviolet light, visible light, or suitable laser irradiation<\/strong>, and notes usefulness in <strong>dark curing systems<\/strong> \ubc0f <strong>high-pigment coatings<\/strong>.<\/p>\n<p>784 usually deserves earlier attention when:<\/p>\n<ul>\n<li>the dry-film process is not just a standard UV exposure workflow<\/li>\n<li>visible-light or laser irradiation is part of the real production route<\/li>\n<li>the material sits closer to high-precision photosensitive-layer work than to a routine laminated imaging film<\/li>\n<li>the team needs a product path that fits advanced imaging behavior, not only conventional thin-film screening<\/li>\n<\/ul>\n<p>That makes 784 a more natural lead candidate for advanced dry-film imaging programs than for a simple 365 nm benchmark.<\/p>\n<h2>How buyers should choose before requesting samples<\/h2>\n<h3>1. Start with the real exposure route<\/h3>\n<p>Do not begin with product names alone. Start with whether the process is a 365 nm thin-film route, a longer-wave cure-through problem, or a visible-light or laser imaging platform.<\/p>\n<h3>2. Keep film build visible<\/h3>\n<p>A very thin laminated dry film should not automatically be screened the same way as a more difficult or penetration-limited imaging structure.<\/p>\n<h3>3. Treat optical difficulty as a real decision trigger<\/h3>\n<p>Even when the process name is still dry film photoresist, the shortlist changes quickly if the film becomes darker, more filled, or harder for light to penetrate.<\/p>\n<h3>4. Separate routine imaging from advanced precision imaging<\/h3>\n<p>Some dry-film programs are mostly about practical production benchmarking. Others are really about higher-end photosensitive-layer control. Those two jobs should not share the same first shortlist by default.<\/p>\n<h3>5. Keep the first lab round tight<\/h3>\n<p>A practical first screen is often one 365 nm thin-film benchmark, one longer-wave penetration route, and one visible-light precision route only if the line genuinely needs it. That usually gives cleaner signal than testing many similar photoinitiators at once.<\/p>\n<h2>Recommended Longchang product and article paths<\/h2>\n<ul>\n<li><strong>Thin 365 nm dry-film route:<\/strong> <a href=\"https:\/\/longchangchemical.com\/ko\/product\/photoinitiator-1206\/\">\uad11\uac1c\uc2dc\uc81c 1206<\/a><\/li>\n<li><strong>Long-wave and more difficult dry-film route:<\/strong> <a href=\"https:\/\/longchangchemical.com\/ko\/product\/photoinitiator-369-cas-119313-12-1\/\">\uad11\uac1c\uc2dc\uc81c 369<\/a><\/li>\n<li><strong>Visible-light and precision-imaging route:<\/strong> <a href=\"https:\/\/longchangchemical.com\/ko\/product\/photoinitiator-784-cas-125051-32-3\/\">\uad11\uac1c\uc2dc\uc81c 784<\/a><\/li>\n<li><strong>Related page:<\/strong> <a href=\"https:\/\/longchangchemical.com\/ko\/pcb-photoresist-photoinitiator\/\">Photoinitiator for PCB Photoresists<\/a><\/li>\n<li><strong>Related page:<\/strong> <a href=\"https:\/\/longchangchemical.com\/ko\/laser-direct-imaging-photoinitiator\/\">Photoinitiator for Laser Direct Imaging<\/a><\/li>\n<li><strong>Related page:<\/strong> <a href=\"https:\/\/longchangchemical.com\/ko\/electronic-material-ink-photoinitiator\/\">Photoinitiator for Electronic Material Inks<\/a><\/li>\n<\/ul>\n<h2>\uc790\uc8fc \ubb3b\ub294 \uc9c8\ubb38<\/h2>\n<h3>Which photoinitiator is the best starting point for dry film photoresist?<\/h3>\n<p>There is no single winner for every dry-film system. In Longchang&#8217;s current product positioning, 1206 is usually the strongest first benchmark for thin 365 nm dry-film imaging, 369 is stronger for longer-wave or more difficult cure-through, and 784 moves ahead when visible-light or laser precision becomes central.<\/p>\n<h3>When should buyers move from 1206 to 369?<\/h3>\n<p>Move from 1206 toward 369 when the real risk is no longer thin-film sensitivity but cure-through in a more optically difficult dry-film imaging system that behaves closer to darker photoresist or imaging-photopolymer chemistry.<\/p>\n<h3>When does 784 belong in the shortlist?<\/h3>\n<p>784 belongs in the shortlist when the project is tied to visible-light curing, laser-assisted imaging, precision photosensitive layers, or advanced imaging behavior that goes beyond a routine laminated dry-film benchmark.<\/p>\n<h3>Are 1206, 369, and 784 interchangeable in dry film photoresist?<\/h3>\n<p>No. They can all appear in photoimaging discussions, but Longchang&#8217;s supported application paths and wavelength logic are different enough that buyers should shortlist them by exposure route, film-build difficulty, and imaging precision rather than by name alone.<\/p>\n<h2>Need a tighter dry-film shortlist?<\/h2>\n<p>If your program is being limited by thin-film sensitivity, long-wave penetration, or visible-light imaging precision, define that bottleneck first and then compare only the most relevant Longchang routes. That usually produces a cleaner qualification plan than treating every dry film photoresist project as the same job.<\/p>","protected":false},"excerpt":{"rendered":"<p>A practical B2B guide to choosing a photoinitiator for dry film photoresist by comparing 1206, 369, and 784 across thin laminated films, long-wave cure needs, and visible-light or laser imaging routes.<\/p>","protected":false},"author":6,"featured_media":10144,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[1],"tags":[],"class_list":["post-10143","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-uncategorized"],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v25.3.1 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Photoinitiator for Dry Film Photoresist: 1206 vs 369 vs 784<\/title>\n<meta name=\"description\" content=\"Compare 1206, 369, and 784 for dry film 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